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Etch Suppressor for Electromagnetic Radiation Etching of Polymers

IP.com Disclosure Number: IPCOM000037770D
Original Publication Date: 1989-Jun-01
Included in the Prior Art Database: 2005-Jan-30

Publishing Venue

IBM

Related People

Authors:
Donelon, JJ [+details]

Abstract

Etch rate of a polymer, e.g. polyimide, by electromagnetic radiation, e.g. laser light, is suppressed by roughening the polymer surface. The incident radiation slowly etches through the roughened surface layer and then etches the bulk polymer at the etch rate for the unroughened polymer. The roughened surface is useful as a polymer etch stop.