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Tungsten Alignment Marks for Electron Beam Lithography

IP.com Disclosure Number: IPCOM000037779D
Original Publication Date: 1989-Jun-01
Included in the Prior Art Database: 2005-Jan-30

Publishing Venue

IBM

Related People

Authors:
Pearson, DJ Rudeck, P [+details]

Abstract

Disclosed is a technique by which electron beam alignment marks are fabricated in planar integrated circuit structures. These alignment marks (Fig. 1) allow registration of electron beam defined patterns on planar dielectric and low-Z metal films without the need to selectively remove these films over the alignment mark area.