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Linewidth Measurement Standard Fabrication Method Disclosure Number: IPCOM000037780D
Original Publication Date: 1989-Jun-01
Included in the Prior Art Database: 2005-Jan-30

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Rosenfield, MG [+details]


A technique is described whereby a linewidth measurement standard for scanning electron microscope (SEM) metrology can be fabricated using electon-beam lithography. The resist used should be able to withstand repeated exposures to vacuum and electron beams after development.