Browse Prior Art Database

Linewidth Measurement Standard Fabrication Method

IP.com Disclosure Number: IPCOM000037780D
Original Publication Date: 1989-Jun-01
Included in the Prior Art Database: 2005-Jan-30

Publishing Venue

IBM

Related People

Authors:
Rosenfield, MG [+details]

Abstract

A technique is described whereby a linewidth measurement standard for scanning electron microscope (SEM) metrology can be fabricated using electon-beam lithography. The resist used should be able to withstand repeated exposures to vacuum and electron beams after development.