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Nickel-Iron Sputter Process

IP.com Disclosure Number: IPCOM000037844D
Original Publication Date: 1989-Jul-01
Included in the Prior Art Database: 2005-Jan-30

Publishing Venue

IBM

Related People

Authors:
Chesnutt, RB Jubb, N [+details]

Abstract

A process and operating conditions have been developed to sputter deposit NiFe alloy suitable for use in the fabrication of a high performance magnetoresistive sensor. For optimum head performance, films must have near zero magnetostriction, low coercivity (Hc), and a high degree of change in resistance with a change in magnetic field direction (delta R/R). Other manufacturing requirements were tool throughput, tool/process availability, and control/stability of film electrical and magnetic properties.