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Dry Lithographic Process

IP.com Disclosure Number: IPCOM000037850D
Original Publication Date: 1989-Jul-01
Included in the Prior Art Database: 2005-Jan-30

Publishing Venue

IBM

Related People

Authors:
Lin, BJ Yang, JM Yang, RM [+details]

Abstract

This article relates generally to integrated circuit construction and, more particularly, to a process of defining submicron features by a dry lithographic process.