Browse Prior Art Database

Resist Patterning by Dry Development

IP.com Disclosure Number: IPCOM000037925D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-31

Publishing Venue

IBM

Related People

Authors:
Babich, ED Hatzakis, M Shaw, JM Witman, DF [+details]

Abstract

Disclosed is a process to develop resist images by dry development. This process is carried out by pattern exposure followed by incorporation of silicon atoms into the exposed areas.