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Resist Patterning by Dry Development Disclosure Number: IPCOM000037925D
Original Publication Date: 1989-Aug-01
Included in the Prior Art Database: 2005-Jan-31

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Babich, ED Hatzakis, M Shaw, JM Witman, DF [+details]


Disclosed is a process to develop resist images by dry development. This process is carried out by pattern exposure followed by incorporation of silicon atoms into the exposed areas.