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Ion Beam Cr Etch Process

IP.com Disclosure Number: IPCOM000037969D
Original Publication Date: 1989-Sep-01
Included in the Prior Art Database: 2005-Jan-31

Publishing Venue

IBM

Related People

Authors:
Curry, FD Kasun, T Quinn, AM [+details]

Abstract

An ion beam etching process is used to remove chromium (Cr) from vias in a layer of polyimide on a circuitized substrate which is being processed to make an electronic package to carry a semiconductor chip, or other such electronic device.