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Laser-Assisted Chemical Etching of Metals

IP.com Disclosure Number: IPCOM000038002D
Original Publication Date: 1989-Sep-01
Included in the Prior Art Database: 2005-Jan-31

Publishing Venue

IBM

Related People

Authors:
Moyland, CR Tyndall, GW [+details]

Abstract

A number of refractory metals such as nickel and titanium have been etched via irradiation of the surface at 248 nm with a pulsed excimer laser in the presence of an alkyl halide. Etch rates in the range of 1-20 Angstroms/sec-1 are obtained at a laser repetition rate of 10 hz. The etch rates are strongly dependent on the laser fluence, the metal surface being etched, and both the identity and the pressure of the alkyl halide.