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Wet Etch End-Point Prediction Disclosure Number: IPCOM000038068D
Original Publication Date: 1989-Oct-01
Included in the Prior Art Database: 2005-Jan-31

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Eisenhuth, GC Kurdziel, MT Royster, RJ Vescio, JE [+details]


Disclosed is a process which is being used to predict the total etch time required to etch Metal Masks. The concept works on the principle of predicting the total time required to etch the mask based on an etch break-thru.