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Polymer Sidewall Image Transfer

IP.com Disclosure Number: IPCOM000038177D
Original Publication Date: 1989-Dec-01
Included in the Prior Art Database: 2005-Jan-31

Publishing Venue

IBM

Related People

Authors:
Bruce, JA Holmes, SJ Lin, B [+details]

Abstract

Certain polymers which have been exposed to light create a phenolic OH group and react to an organometallic vapor, e.g. hexamethyldisylazane (HMDS), to become resistant to etching in an oxygen plasma. By varying time and temperature of HMDS exposure, only an edge region of the exposed area of the polymer becomes resistant to etching. Thus, a polymer sidewall image which is smaller than can be defined by lithographic mask design remains after an oxygen plasma development process.