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Improved Filament Assembly for Ion Implantation Apparatus

IP.com Disclosure Number: IPCOM000038362D
Original Publication Date: 1987-Jan-01
Included in the Prior Art Database: 2005-Jan-31

Publishing Venue

IBM

Related People

Authors:
Frederick, JJ Jung, G Popp, G [+details]

Abstract

Ion implantation apparatus used in the manufacture of semiconductor devices typically includes a dosimetry cone having filaments for electron flooding and neutralization of the ion beam. Failures of the electron flooding unit due to cracks and plating in the filament cartridge assembly are reduced by an improved filament assembly. Fig. 1 shows a typical dosimetry cone 1, through which an ion beam passes, including two removable filament cartridge and header assemblies 2 for supporting the filaments 3 (one shown). An enlarged view of one end of the improved cartridge assembly 2 is shown in Fig. 2. Each end of filament 3 is supported by a conductive clamping chuck 4, concentrically mounted within a conductive sleeve 5.