Browse Prior Art Database

Cantilever System for Chemical Vapor Deposition and Hot Process Furnaces

IP.com Disclosure Number: IPCOM000038366D
Original Publication Date: 1987-Jan-01
Included in the Prior Art Database: 2005-Jan-31

Publishing Venue

IBM

Related People

Authors:
Dumontel, A Passefort, JC [+details]

Abstract

This article describes an improved system for loading and unloading silicon wafers into a process tube of a furnace of a diffusion oven. The key advantage of the described system consists in suppressing the friction between the quartz magazines containing the wafers and the quartz process tube. Quartz dust generated by quartz-to-quartz friction is detrimental to product yields. The mechanical system which moves on two rails and is located in the clean-hood furnace and centered with regard of the tube axis system comprises: - A lower tray where the ball rolling is located allowing the shift and positioning of the system. - An upper tray which is movable along four columns. Tray movement is made by a cam (inclined plane) with a pneumatic jack. - Movement in the Y-axis is made by screws.