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Selective Metal Deposition by a Resistless Liftoff Process

IP.com Disclosure Number: IPCOM000038762D
Original Publication Date: 1987-Mar-01
Included in the Prior Art Database: 2005-Feb-01

Publishing Venue

IBM

Related People

Authors:
Maier, WF Scott, BA Smith, DA [+details]

Abstract

There are many steps in microelectronic device processing when the selective deposition of metals becomes a critical limiting issue.