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Electron Beam Microanalysis of Thin Alloy Films

IP.com Disclosure Number: IPCOM000038771D
Original Publication Date: 1987-Mar-01
Included in the Prior Art Database: 2005-Feb-01

Publishing Venue

IBM

Related People

Authors:
Schrader, M Weiss, H [+details]

Abstract

Thin alloy films, consisting of elements A and B, can be simultaneously analyzed for film thickness d and concentration c of element A, even if element B is also contained in the substrate supporting the film. The method used for analysis is based on exposing the film to an electron beam and simultaneously measuring the (relative) intensities of two X-ray lines, say, AKa and ALa, of element A which is not present in the substrate. The signal of element B is not evaluated. Film thickness and concentration of A are then determined from intensity/ thickness diagrams (Figs. 1 and 2) for the respective X-ray lines with concentration curve families. The intensity/thickness diagrams can be calculated from known electron beam excitation parameters and must be calibrated by measuring standard samples.