Stud Interlevel Contact Resistance Monitoring
Original Publication Date: 1987-Mar-01
Included in the Prior Art Database: 2005-Feb-01
By means of four-point probe monitors, measurement of total contact resistance between two levels of conductive lines connected by an interlevel stud and characterization of the individual components contributing to the total resistance may be determined. The figure is a schematic of a monitor structure comprised of a first level wire M1 interconnected to a second level wire M2 through a metal stud between levels. Total resistance R of the interconnection between M1 and M2 is R = V/I, where I is the current passing through the interconnection and V is the voltage developed across the interconnection.