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CVD OF SILICON AND SILICON COMPOUNDS USING Si2Cl6

IP.com Disclosure Number: IPCOM000038879D
Original Publication Date: 1987-Mar-01
Included in the Prior Art Database: 2005-Feb-01

Publishing Venue

IBM

Related People

Authors:
Scott, BA Taylor, RC [+details]

Abstract

Hexachlorodisilane (Si2Cl6) is a silicon halide dimer that is an excellent alternative to silane (SiH4) and mono-silicon chlorides (SiH2Cl2) as a source for chemical vapor deposition (CVD) of silicon films, and probably silicon nitride, silicon dioxide, and metal silicide films. Si2Cl6 is a non-flammable liquid which, due to its room temperature vapor pressure of 4 mm, can be conveniently transported to a CVD reactor by passing H2 or an insert gas through a bubbler containing the liquid. The decomposition also will proceed in the absence of hydrogen. Films may be deposited at lower temperatures than those required for SiCl4 (1100oC) or SiH2Cl2 and is far safer than using spontaneously flammable SiH4 .