STRESS REDUCTION IN TiSi2 FILMS
Original Publication Date: 1987-Apr-01
Included in the Prior Art Database: 2005-Feb-01
TiSi2 is an attractive material for transistor gate and interconnect metallurgy due to its low resistivity. One of the major difficulties associated with this material is that production of the lowest resistivity films, either from reaction of Ti with Si or by annealing a co-deposited TiSi2 film, can require annealing temperatures in excess of 800oC in order to obtain sufficiently low resistivity. The figure shows the resistivity of TiSi2 films deposited on silicon and on SiO2, for different temperatures. From this, it is apparant that lower annealing temperatures can be used to crystallize TiSi2 films deposited on Si in order to obtain the desired resistivity, as compared to the temperatures that are required when TiSi2 is deposited on SiO2 .