Portable Dynamic Pressure-Sensing Apparatus
Original Publication Date: 1987-Apr-01
Included in the Prior Art Database: 2005-Feb-01
This article concerns the development of a portable pressure-sensing equipment employable as a standard in the measurement and calibration of double-sided wafer polishers. It offers a capability for measuring the actual pressure exerted on a wafer throughout the total polishing cycle, in a dynamic mode, and can be used as a standard for all polishers. (Image Omitted) Frictional variations inherent in the design of existing wafer polishers lead to a lack of process reproducibility when programmed changes in wafer pressure are called for. The disclosed pressure sensing assembly, comprising three load cells (strain gage) contained between two thrust bearings (radial bearings), is illustrated in Fig. 1.