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Automated Surface Profile and Film Thickness Analyzer

IP.com Disclosure Number: IPCOM000039244D
Original Publication Date: 1987-May-01
Included in the Prior Art Database: 2005-Feb-01

Publishing Venue

IBM

Related People

Authors:
Chastang, JC Hildenbrand, WW Levanoni, M [+details]

Abstract

1. INTRODUCTION Current surface profile measuring techniques are accurate, but most require a direct contact between a probe and the sample. There are instruments and techniques for accurate measurement of film thickness (such as ellipsometers and film thickness analyzers) which use optical techniques for measuring in the micrometer range. Thick films are not measured by such instruments due to wavelength ambiguity in the results. A light section microscope is not accurate and requires a skilled operator. No currently available instruments automatically and easily measure films whose thicknesses lie beyond the range of interferometric techniques and below the range of simple optomechanical devices. (Image Omitted) 2.DESCRIPTION OF INSTRUMENT 2.1 General Principle The instrument in Fig.