Browse Prior Art Database

RF Work Coil for Evaporative Deposition System

IP.com Disclosure Number: IPCOM000039651D
Original Publication Date: 1987-Jul-01
Included in the Prior Art Database: 2005-Feb-01

Publishing Venue

IBM

Related People

Authors:
Brown, WW Lupul, FT McKay, RJ Promnitz, DK Sward, RK [+details]

Abstract

A radio frequency (RF) coil used to heat metals during evaporative deposition has improved mechanical stability and provides a more consistent electrical load to the RF generator. In the manufacture of semiconductor integrated circuit devices, metal layers are frequently formed on the devices by evaporative deposition. In many deposition systems, metals to be deposited are heated in a crucible surrounded by an RF coil. Excessive movement of the coil during heating causes changes in its electrical characteristics which varies the load on the RF generator which energizes the coil. This makes it difficult to obtain consistent deposition results from one production run to another. Referring to Fig.