Original Publication Date: 1987-Aug-01
Included in the Prior Art Database: 2005-Feb-01
Typical negative photoresists, which use cinnamoyl chloride or acrylic functional groups as photo crosslinkable groups, are neither thermally stable nor plasma etch resistant. By incorporating radiation curable groups with polysiloxane polymers, stability, radiation sensitivity, and plasma resistance can be obtained. The synthesis is a simple condensation reaction, whereby radiation sensitive monomers can be reacted with polysiloxanes having amino, hydroxy, or thio - funtional groups pendant to the backbone (Si-O)x polymer chain. This type of synthesis has several advantages: 1)The sensitivity of the polymer can be optimized by adjusting the ratio of pendant groups. 2)Highly crosslinked branched structures are formed upon irradia tion, resulting in thermally stable polymers.