Servo-Controlled Photoresist Dipcoating
Original Publication Date: 1987-Aug-01
Included in the Prior Art Database: 2005-Feb-01
A method has been proposed for obtaining a uniform photoresist coating of metal masks used in semiconductor manufacturing processes. The proposal suggests varying the speed at which the mask is withdrawn when dipcoating takes place. An alternative is the draining of the photoresist solution at a variable rate. In dip coating of flat surfaces, such as a metal mask for photoresist processing, when the item being coated is withdrawn from the solution, it is difficult to obtain a uniform thickness of the coating over the entire surface. This proposal suggests that a programmable servo controlled mechanism 1 (Fig. 1) be used to withdraw the metal mask 2 out of the photoresist tank 3 at a variable speed. The speed would be such that a uniform coating would result on the mask.