V-Groove Gallium Arsenide Junction FET
Original Publication Date: 1987-Sep-01
Included in the Prior Art Database: 2005-Feb-01
A junction FET is proposed that is built on a GaAs substrate having a V-shaped groove. Formed on top of an n-channel which extends over the planar and the grooved surface is a molecular beam epitaxy (MBE) deposited amphoterically doped GaAs layer. Because of the crystal orientation dependence, the conductivity of this layer is n+ in the planar regions and p+ on the walls of the groove. The p+ section and the underlaying n-channel provide the desired junction. Use is made of the phenomenon that the conductivity type obtained with Si doping during the growth of GaAs by molecular beam epitaxy (MBE) is dependent on the crystal orientation of the substrate. For example, on a (100) surface the Si occupies Ga sites, resulting in n-type material, while on (111) planes the Si substitutes for As, thereby making the GaAs p-type.