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Improved Ion Source for Use With Reactive Ion Beams

IP.com Disclosure Number: IPCOM000040299D
Original Publication Date: 1987-Oct-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Cuomo, JJ Guarnieri, CR Ramanathan, KV Yee, DS [+details]

Abstract

A technique is described whereby the life of hot cathode filaments is increased through a process which coats metal parts with a conductive metallic oxide. The resulting product is an improved ion source, for use with reactive ion beams. Kaufman ion sources are large-area ion sources used in material processing. When used with inert gases or reactive gases at relatively low power levels, they are very reliable. However, when used with reactive gases, such as oxygen at high power levels, the run time is limited. This is due to a build-up of insulating oxide layers on the anode of the source. This build-up of insulating oxide layer reduces the discharge current until the discharge is extinguished, when operated at a constant voltage.