Unique Construction of High Accuracy Multipole Electric E-Beam Deflectors
Original Publication Date: 1987-Nov-01
Included in the Prior Art Database: 2005-Feb-02
The fabrication of electric multipole deflectors for application in high resolution, high accuracy electron-beam (E-beam) lithography tools requires a level of precision difficult to achieve with conventional techniques. The fabrication technique and structure of the electric multipole deflector described meet this requirement. The multipoles are electrically isolated without physical separation. Irrespective of the number of elements employed, multipole deflectors must have the following attributes: 1) Very high mechanical accuracy to minimize field and spot distortions. 2) Low capacitance and leakage to allow high speed deflection, requiring a minimum of bulk material and short connecting leads.