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Hydrofluoric Acid Treatment of Quartz Surfaces

IP.com Disclosure Number: IPCOM000040457D
Original Publication Date: 1987-Nov-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Levinson, WA Precious, T Schmitt, HF Wood, R [+details]

Abstract

By treating a quartz surface on a silicon wafer with a brief exposure to a dilute solution of buffered hydrofluoric acid, the surface is modified. The treatment improves the adhesion of a photoresist coating needed for further processing steps. Poor adhesion of the photoresist coating on quartz deposited on silicon wafers can be a yield detractor. The normal preparation process is to first preclean the wafer with a combination of solutions and then bake the wafer dry. The preclean step is then followed by an adhesion promoter, such as a silazane, prior to application of the photoresist coating. The improved process adds a hydrofluoric acid treatment after the precleaning step and prior to the application of the adhesion promoter.