Silylated Photoresist Films As Spacers for Liquid Crystal Devices
Original Publication Date: 1987-Nov-01
Included in the Prior Art Database: 2005-Feb-02
Silylated photoresist films can be used as cell-spaces to achieve uniform domains in the manufacture of liquid crystal displays. The silylation procedures are as follows: 1. Developed the photoresist film in the usual manner prescribed for that resist, 2. Prepare a silylation solution of 10% hexa-methyl-cyclo- trisilazane, 1% n-methyl-pyrrolidine, and 89% xylene, 3. Soak the photoresist film in the above solution at 40oC for 15 minutes per mm, 4. Rinse with xylene and blow dry, and 5. Bake samples at 90oC for 15 minutes. The silylated photoresist is stable to temperatures above 400oC. For processing applications for light valves, light-absorbing dyes can be dissolved into the photoresist film and be used as a light-blocking layer as well as a spacer.