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Adjustable Flat Gas-Inlet Detector Disclosure Number: IPCOM000040578D
Original Publication Date: 1987-Dec-01
Included in the Prior Art Database: 2005-Feb-02

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Cashin, MJ Grundon, FR Wong, MC [+details]


Here a plasma chemical vapor deposition (CVD) reaction system is modified by replacing an existing cone deflector with an adjustable flat plate deflector. The modification provides for even reactant gas dispersion and uniform plasma film thickness laid down on the semiconductor devices being processed. In some plasma CVD reactors, such as the one shown in Fig. 1, reactant gases 1 pass through an opening in a wafer platen 2 and are deflected by a deflector cone 3 placed above the gas-inlet tube 4. The deflectors sit on a quartz tripod 5 and are easily tilted (as shown in the figure) or misaligned during routine operations. Since the gas flow no longer impinges evenly on the inverted deflector cone 3, there is an uneven distribution of gas flow across wafer platen 2.