Browse Prior Art Database

Self-Centering Device Mask Alignment Fixture

IP.com Disclosure Number: IPCOM000040590D
Original Publication Date: 1987-Dec-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Antonie, CH Drzewinski, GK Murray, TK [+details]

Abstract

This article describes an improved device mask alignment fixture which can be used for precise alignment of substrates during metal evaporation processes. The fixture uses opposing identical spring-plates to body-center substrates with loose dimensional tolerance. This provides for faster and more precise mask alignment processes. (Image Omitted) Referring to Fig. 1, spring-plate 10 is comprised of cantilevered spring arms 12 having flat faces 14. A pair of these plates 10 are used together, with one plate rotated 180 degrees with respect to the other. Fig. 2 shows two plates 10 in the open position. Substrate 16 is clamped when the two plates 10 are slid in opposite directions. Fig. 3 illustrates the substrate 16 in its clamped position.