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Pattern for Electrical Assessment of Images Formed in Conductive Films

IP.com Disclosure Number: IPCOM000040780D
Original Publication Date: 1987-Jan-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Dinklage, JB Kerbaugh, ML Underhill, JA [+details]

Abstract

A test pattern is described which enables sensitive electrical assessment of the success with which images are formed in electric ally conductive thin films. By measuring electrical resistance of the pattern with a four point probe, small shifts from nominal dimensions caused by variations in a photoetching process are readily detected.