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Liquid Source/Hazardous Chemical Gas Box for Plasma Etchers Disclosure Number: IPCOM000040782D
Original Publication Date: 1987-Jan-01
Included in the Prior Art Database: 2005-Feb-02

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Pinto, JN [+details]


The system shown in the figure safely delivers liquid chemica to a plasma etch system and eliminates the need for disconnecting gas lines to relieve vapor lock conditions.