Browse Prior Art Database

Liquid Source/Hazardous Chemical Gas Box for Plasma Etchers

IP.com Disclosure Number: IPCOM000040782D
Original Publication Date: 1987-Jan-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Pinto, JN [+details]

Abstract

The system shown in the figure safely delivers liquid chemica to a plasma etch system and eliminates the need for disconnecting gas lines to relieve vapor lock conditions.