Aqueous-Base Developable Positive Resist Compositions
Original Publication Date: 1987-Jan-01
Included in the Prior Art Database: 2005-Feb-02
Onium salts such as triphenylsulfonium hexafluoroantimonate inhibit dissolution of novolac resins in aqueous base. The two-component resist film is rendered more soluble in aqueous base upon radiation, thereby providing positive-tone image of the mask.