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Aqueous-Base Developable Positive Resist Compositions

IP.com Disclosure Number: IPCOM000040798D
Original Publication Date: 1987-Jan-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Ito, H [+details]

Abstract

Onium salts such as triphenylsulfonium hexafluoroantimonate inhibit dissolution of novolac resins in aqueous base. The two-component resist film is rendered more soluble in aqueous base upon radiation, thereby providing positive-tone image of the mask.