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Debris Free Polymer Laser Etching

IP.com Disclosure Number: IPCOM000040816D
Original Publication Date: 1987-Jan-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Donelon, JJ [+details]

Abstract

Essentially debris free etching in polyimide is possible without enclosing the specimen in a vacuum chamber. Successful laser ablation experiments were carried out at both 248 nm and 308 nm.