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Radiation-Induced Repair of Clear Defects in Masks

IP.com Disclosure Number: IPCOM000040863D
Original Publication Date: 1987-Feb-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Baum, TH Jackson, RL Jones, CR Pederson, LA [+details]

Abstract

The repair of clear mask defects can be achieved through the u of volatile organometallic complexes which can be locally decompos The decomposition can be induced thermally, photochemically, or by other energetic pathways.