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This article relates generally to thin film deposition and, mo particularly, to deposition of titanium and tungsten at lower temperatures by chemical vapor deposition.
English (United States)
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Chemical Vapor Deposition of Titanium-Tungsten Alloy
This article relates generally to thin film deposition and, mo particularly, to
deposition of titanium and tungsten at lower temperatures by chemical vapor
Titanium and tungsten can be co-deposited with improved conformance,
purity and uniformity by using chemical vapor deposition. The process combines
tungsten hexafluoride, hydrogen and titanium iodide in the reaction chamber.
Iodide and hydrogen reductions occur as follows:
Annealing of the structure yields a polycrystalline phase of the titanium-
tungsten alloy. Stoichiometry can be arranged through flow adjustment of the
titanium iodide gas.