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Chemical Vapor Deposition of Titanium-Tungsten Alloy

IP.com Disclosure Number: IPCOM000040874D
Original Publication Date: 1987-Feb-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Gupta, D Joshi, RV [+details]

Abstract

This article relates generally to thin film deposition and, mo particularly, to deposition of titanium and tungsten at lower temperatures by chemical vapor deposition.