Browse Prior Art Database

X-ray Mask/Membrane Fabrication

IP.com Disclosure Number: IPCOM000040877D
Original Publication Date: 1987-Feb-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Brady, MJ Speidell, JL [+details]

Abstract

Lithographic x-ray masking membranes in silicon wafers are constructed with greater strength, smoother surfaces and selective accurate thickness by using ion implantation of buried dielectric layer as an etch stop.