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X-ray Mask/Membrane Fabrication Disclosure Number: IPCOM000040877D
Original Publication Date: 1987-Feb-01
Included in the Prior Art Database: 2005-Feb-02

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Brady, MJ Speidell, JL [+details]


Lithographic x-ray masking membranes in silicon wafers are constructed with greater strength, smoother surfaces and selective accurate thickness by using ion implantation of buried dielectric layer as an etch stop.