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Monitoring Plasma Processes

IP.com Disclosure Number: IPCOM000040884D
Original Publication Date: 1987-Mar-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Mlynko, WE Susko, RA [+details]

Abstract

Plasma processes are monitored in a non-destructive manner by placing a magnetic tape or a magnetic bar code on or near the target being etched. The plasma, as it etches the target, also etches the magnetic tape or magnetic bar code. The magnetic response of the tape or code is read, and used to operate a computer controlled robotic system to control the process sequencing.