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Plasma Induced Masking Disclosure Number: IPCOM000040927D
Original Publication Date: 1987-Mar-01
Included in the Prior Art Database: 2005-Feb-02

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Brady, MJ Gambino, RJ Ruf, RR [+details]


Rare earth metals are dry etched with improved edge definition and little degradation of film quality by using a plasma-induced coating to produce the etching mask.