Browse Prior Art Database

Plasma Induced Masking

IP.com Disclosure Number: IPCOM000040927D
Original Publication Date: 1987-Mar-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Brady, MJ Gambino, RJ Ruf, RR [+details]

Abstract

Rare earth metals are dry etched with improved edge definition and little degradation of film quality by using a plasma-induced coating to produce the etching mask.