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Browse Prior Art Database

Sub-Micron Contact Hole Inspection Monitor Wafer

IP.com Disclosure Number: IPCOM000040959D
Original Publication Date: 1987-Apr-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Fredericks, EC Hsu, L Totten, LA [+details]

Abstract

This article describes a convenient way for accurately verifying with an optical microscope whether sub-micron contact holes have been opened sufficiently during etch processes. The only method now available for inspecting sub-micron contact holes is with an electron microscope.