Substrate Exposure Tooling Fixture
Original Publication Date: 1987-Apr-01
Included in the Prior Art Database: 2005-Feb-02
In the manufacture of thin films on substrates it is often necessary to use photoresist materials and masks. On occasion the photoresist material can become deposited on areas of the substrate where, if it is not removed, it will create problems during subsequent processes. At present, this excess photoresist is often removed by hand. The need for hand removal of excess photoresist can be avoided by providing a masking assembly in which all areas of the substrate are exposed to radiation except where the photoresist material is masked.