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Residual Photoresist Measured by Fluorescence Analysis

IP.com Disclosure Number: IPCOM000041001D
Original Publication Date: 1987-May-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Gianopulos, WA Knight, SE [+details]

Abstract

Quantitative measurement of residual photoresist is facilitate by means of the addition of an azo-dye to photoresist and mea- surement by fluorescence analysis.