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A Sidewall Image Definition Technique for Producing Extremely Fine Semiconductor Chip Features

IP.com Disclosure Number: IPCOM000041005D
Original Publication Date: 1987-May-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Abrams, AD Cronin, JE [+details]

Abstract

A simple process is reported for defining a mask which will produce extremely fine image sizes and line pitches in a semiconductor wafer utilizing current photolithographic tools and techniques.