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Chromium Plasma Etch Process with Endpoint Detection

IP.com Disclosure Number: IPCOM000041012D
Original Publication Date: 1987-May-01
Included in the Prior Art Database: 2005-Feb-02

Publishing Venue

IBM

Related People

Authors:
Egitto, FD [+details]

Abstract

The endpoint of a chromium etching process is detected by monitoring the intensity of the luminescence which is in the area of the sample being etched.