Filtered Cartridge Dispense for Spin-Coating
Original Publication Date: 1987-May-01
Included in the Prior Art Database: 2005-Feb-02
The Electronics Industry state-of-the-art means of applying photoresist, which in itself is a polymer, is to have a container of this material in an adjacent room or "core area" and either pump or force out with a pressure vessel to the wafer handling and spinning tool with a length of tubing as long as eight feet. This means of dispensing photoresist is quite satisfactory for the standard resists but creates problems in two areas when trying to dispense HC (high contract) with imidizol or TNS because the dispensing apparatus now becomes a particle generator.