Helium/Cadmium Laser Assisted Deposition of Chromium for Optical Lithographic Mask Repair
Original Publication Date: 1987-May-01
Included in the Prior Art Database: 2005-Feb-02
Cr(CO)6 vapor is photodissociated by means of a cw uv laser to cause photochemical deposition of chromium. This process is useful in the repair of optical lithographic masks, with the deposition taking place onto a clear defect site. A sealed- cavity Helium/Cadmium laser operating at 325 nm is used. Ex- cellent reproducibility, deposit shape, adhesion and process control have been achieved.