Method for Controlling Composition of Compound Thin Films
Original Publication Date: 1984-Mar-01
Included in the Prior Art Database: 2005-Feb-03
The composition of reactively deposited compounds may be controlled by using optical emission spectroscopy to continuously monitor atoms resputtered from the depositing surface and controlling the intensity of the reactive ion beam in dependence thereupon. Thin films of oxides, nitrides, carbides, and other reactively formed compounds have wide applications in semiconductor devices, optical devices, piezoelectric devices, hard coatings, low-friction coatings, and other areas. In most of these applications, control of the compound composition and structure is important to provide desired film properties, such as dielectric constant, transparency, piezoelectric coefficient, hardness, and coefficient of friction.