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Method for lithography-free production of pedestals for replacement metal gate integration with a physical gate length of 12 nm or less

IP.com Disclosure Number: IPCOM000042255D
Publication Date: 2005-Feb-03

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for lithography-free production of pedestals for replacement metal gate integration with a physical gate length of 12 nm or less. Benefits include improved functionality.