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Backscattering Simulation by Electron Beam Reflection

IP.com Disclosure Number: IPCOM000042278D
Original Publication Date: 1984-May-01
Included in the Prior Art Database: 2005-Feb-03

Publishing Venue

IBM

Related People

Authors:
Brunner, M [+details]

Abstract

It is possible to simulate emission of backscattered electrons from a point by reflecting a scanning electron beam from a point charge. This may be used to inspect the interior of electron beam chambers for charging surfaces and, in particular, to optimize the design and operation of secondary electron analyzers. Backscattered electrons are produced upon impact of an electron beam on a target in an electron beam tool. Backscattered electrons are emitted with almost primary energy and bombard surfaces in the tool's chambers where they subsequently cause secondary emission of low energy electrons. These secondary electrons emitted from the tool's surfaces contribute to a secondary electron detector signal together with those produced directly from the target itself.