Browse Prior Art Database

Method for fast photoresist stripping using deep ultraviolet curing and ozone chemistry

IP.com Disclosure Number: IPCOM000042319D
Publication Date: 2005-Feb-03

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method to provide fast photoresist stripping using deep ultraviolet (DUV) curing and ozone chemistry. Benefits include improved performance and improved environmental friendliness.