Browse Prior Art Database

Thermal Acceleration of UV Hardening for Diazoquinone/Novolak Resist

IP.com Disclosure Number: IPCOM000042750D
Original Publication Date: 1984-Jun-01
Included in the Prior Art Database: 2005-Feb-04

Publishing Venue

IBM

Related People

Authors:
Babie, WT Klymko, PW [+details]

Abstract

Plasma hardening is conventionally used to stabilize photoresist prior to high temperature processing. The technique is employed to maintain image dimension and profile, which can degrade with simple baking. Even though plasma treatment stabilizes photoresist to a substantial degree, the images still incur wrinkling and some dimensional changes. Such distortion becomes critical in high definition lithography. Resist stabilization from UV (ultraviolet) exposure has been reported for several years. Reported performance indicates significantly improved stabilization over plasma techniques. However, the required exposure times have been too long for implementation in manufacturing.